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Name
: Hua Ren
Email
:
hr4@njit.edu
Research Advisor : Dr.
Marek Sosnowski
Research Interest:
Thin Film Deposition Characterization and application
research.
Current Research Work :
Hua is working on
the
effect of ion bombardment during
thin film growth on
thin film structure and various properties. Using low energetic
ions bombarding thin
films during its growth can help to control the deposited
thin film growth with
desired microstructure and various good mechanical,
electrical properties etc. We are
trying to identify the ion bombardment effect on
thin tantalum film
growth, the crystallographic structure and other related
properties. Adding substrate
biasing during RF sputtering, ions can be attracted
towards the substrate and
bombarding the deposited film. The crystallographic
structure of tantalum thin
film was very sensitive to ion bombardment conditions.
By applying proper substrate
biasing, we can growing thin tantalum films with
pure alpha phase , which has
desired structure people can used in different field.
In her experiments
she uses evaporator systems and sputtering chambers. She
has gained significant experience in high vacuum systems as well as
in
characterization techniques.
For more information related to
project contact
Dr.
Marel Sosnowski or
Hua Ren.
Ren's
Previous Research Work :
Polymer blends with superior mechanical and thermal
stability. The application of anti-oxidation specialty
chemicals for enhancing the
application performance of polymer materials. Thin film
deposition and
characterizations.
Publications (Mention If any ) :
1.
Study on the PVC/SMA Blends, Ren Hua, Zhang Yong, Zhang Yinxi
et al.;
Engineering Plastics Application; 2001, 29, (6)
2.
Progressing in PBT/ABS Blends, Ren Hua, Zhangyong,
Zhang Yinxi;
Chinese Plastics, 2001, Dec.
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